p-n junctions in ZnO implanted with group V ions

n-Type ZnO〈Ga〉 films were implanted with 150-keV N⁺ (As⁺) ions to a dose of 7 × 10¹⁵ cm⁻² and then annealed in atomic oxygen at different temperatures. p-Type conductivity was obtained at annealing temperatures in the range 770–870 K. The parameters of the p-type layers were determined by photoluminescence spectroscopy, secondary ion mass spectrometry, and Hall effect measurements. According to the Hall data, the p-type layers had a resistivity of ∼30 Ω cm, carrier mobility of ∼2 cm²/(V s), and carrier concentration of ∼10¹⁸ cm⁻³. The electroluminescence spectra of the p-n junctions produced by ion implantation showed a band at 440 nm, due to recombination via donor-acceptor pairs.