| 高功率CO2激光作用下硅镜热畸变的动态过程研究 |
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| 引用本文： | 张耀宁,库耕.高功率CO2激光作用下硅镜热畸变的动态过程研究[J].激光技术,1998,22(2):116-118. |
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| 作者姓名： | 张耀宁 库耕 |
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| 作者单位： | 1.华中理工大学激光技术国家重点实验室, 武汉, 430074 |
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| 摘 要： | 以光学干涉方法,实验研究了在CO2激光束入射在硅镜上,硅镜热畸变的动态过程。在变形之初,硅镜镜面的位移量变化迅速。对于一面70mm,厚8mm的硅镜,吸收激光功率140W,作用时间4s时最大挠变形0.76μm.这对于高功率短波长激光器而言是不可忽略的。
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| 关 键 词： | 热畸变 高功率激光器 硅镜 挠变形 |
The investigation of the dynamic process on thermal distortion of silicon mirror |
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| Zhang Yaoning,Ku Geng,Zhang XiaoLi,Du Zeming,Cheng Zuhai.The investigation of the dynamic process on thermal distortion of silicon mirror[J].Laser Technology,1998,22(2):116-118. |
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| Authors: | Zhang Yaoning Ku Geng Zhang XiaoLi Du Zeming Cheng Zuhai |
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| Abstract: | Used optical interferometry,the dynamic process of thermal distortion of the silicon mirror was investigated experimentally,while the 2kW CO2 laser beam is used as incident source.The diplacement of surface of the silicon mirror is varying raplidly in the beginning of the distortion.For a silicon mirror,that is 70mm in diameter and 8mm in thickness,the maximum deflection introduced by thermal distortion is 0.76μm,when the absorbed laser power is 140W and the acting time is 4s.It is not an negligible problem to a high power short wavelength laser. |
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| Keywords: | thermal distortion high power laser silicon mirror deflection |
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