| 激光晶化制备多晶硅薄膜技术 |
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| 引用本文： | 袁志军,楼祺洪,周军,董景星,魏运荣,王之江. 激光晶化制备多晶硅薄膜技术[J]. 激光与光电子学进展, 2007, 44(11): 52-57 |
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| 作者姓名： | 袁志军 楼祺洪 周军 董景星 魏运荣 王之江 |
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| 作者单位： | 中国科学院上海光学精密研究所,上海,201800;中国科学院上海光学精密研究所,上海,201800;中国科学院上海光学精密研究所,上海,201800;中国科学院上海光学精密研究所,上海,201800;中国科学院上海光学精密研究所,上海,201800;中国科学院上海光学精密研究所,上海,201800 |
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| 摘 要： | 激光晶化是一种制作晶硅薄膜器件(如薄膜晶体管、太阳能电池)很有效的技术.展望了低温多晶硅薄膜的应用前景,详细介绍了近几年激光晶化制备多晶硅薄膜技术的研究成果,并就激光对非晶硅作用的原理作了简单讨论.
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| 关 键 词： | 薄膜 低温多晶硅 激光晶化 玻璃衬底 |
| 收稿时间： | 2007-05-31 |
| 修稿时间： | 2007-05-31 |
Laser-Induced Crystallization of Polycrystalline Silicon Thin Film |
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| YUAN Zhijun,LOU Qihong,ZHOU Jun,DONG Jingxing,WEI Yunrong,WANG Zhijiang. Laser-Induced Crystallization of Polycrystalline Silicon Thin Film[J]. Laser & Optoelectronics Progress, 2007, 44(11): 52-57 |
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| Authors: | YUAN Zhijun LOU Qihong ZHOU Jun DONG Jingxing WEI Yunrong WANG Zhijiang |
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| Affiliation: | Shanghai Institute of Optics and Fine Mechanics, The Chinese Academy of Sciences, Shanghai 201800 |
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| Abstract: | Laser crystallization is an effective technique for obtaining high-performance polycrystallie Si thinfilm devices, such as TFTs and solar cells. The future development of low-temperature polycrystalline silicon thin film is prospected. Mean-while, the latest progress about the laserinduced crystallization of amorphous silicon thin film is introduced in detail. The working principles of laser and amorphous silicon are reviewed briefly. |
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| Keywords: | thin film low.temperature polycrystalline silicon laser-induced crystallization glass substrate |
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