| Fabrication of Titanium Dioxide Thin Films by DBD-CVD Under Atmosphere |
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| 作者姓名： | 张溪文 郭玉 韩高荣 |
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| 作者单位： | Department of Materials Science and Engineering, Silicon State Key Lab,Zhejiang University, Hangzhou 310027, China |
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| 摘 要： | Titanium dioxide films were firstly deposited on glass substrate by DBD-CVD （dielectric barrier discharge enhanced chemical vapor deposition） technique. The structure of the films was investigated by X-ray diffraction （XRD）, scanning electron microscopy （SEM）. TiO2 films deposited under atmosphere pressure show preferred orientation, and exhibit columnar-like structure, while TiO2 films deposited under low gas pressure show no preferred orientation. The columnar-like structure with preferred orientation exhibits higher photocatalytic efficiency, since the columnar structure has larger surface area. However, it contributes little to the improvement of hydrophilicity. DBD-CVD is an alternative method to prepare photocatalytic TiO2 for its well-controllable property.
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| 关 键 词： | 电解质 化学蒸气 胶卷 钛元素 |
| 收稿时间： | 2007-06-05 |
Fabrication of Titanium Dioxide Thin Films by DBD-CVD Under Atmosphere |
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| Affiliation: | [1]Department of Materials Science and Engineering, Silicon State Key Lab,Zhejiang University, Hangzhou 310027, China |
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| Abstract: | dielectric barrier discharge, chemical vapor deposition, titanium dioxide thin film |
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| Keywords: | dielectric barrier discharge chemical vapor deposition titanium dioxide thin film |
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