Deposition of ZnO thin film on polytetrafluoroethylene substrate by the magnetron sputtering method |
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| Affiliation: | 1. Department of Mechanical and Electron-Mechanical Engineering, National Sun Yat-Sen University, Kaohsiung City 804, Taiwan;2. Graduate Institute of Materials Engineering, National Pingtung University of Science and Technology, Pingtung County 912, Taiwan;3. Medical Devices and Opto-Electronics Equipment Department, Metal Industries Research & Development Center, Kaohsiung City 821, Taiwan |
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| Abstract: | Due to the excellent optical and electrical properties, ZnO thin films deposited on flexible substrates can be used as technologically promising electron devices. Polytetrafluoroethylene (Teflon) had many advanced properties, such as high dielectric strength over various frequencies, low dissipation factor, and high surface electrical resistivity, which had made Teflon a competitive polymer choice in a variety of microelectronic applications. In our work, ZnO film was firstly deposited on Teflon substrate by the magnetron sputtering method. X-ray diffraction data revealed that the ZnO grains were highly c-axis-oriented and nanostructured with the size of 10–30 nm, which was in accordance with the experimental result of Scanning Electron Microscopy. |
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