On the high-temperature oxidation of nickel |
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Authors: | R Haugsrud |
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Affiliation: | Department of Chemistry, Centre for Materials Science, University of Oslo, Gaustadallèen 21, Oslo N-0349, Norway |
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Abstract: | This paper summarizes on some of the extensive experimental data and corresponding models suggested to account for the oxidation mechanism of Ni in the temperature range 500-1400 °C. In addition it reports on in-house experimental data from investigations related to the oxidation of high-purity Ni from 500 to 1300 °C in the oxygen pressure range 1×10−4-1 atm based on TG, measurements of surface kinetics, two-stage oxidation, scanning electron microscopy, atomic force microscopy, secondary ion mass spectroscopy etc. The main part of this paper focuses on the more complex models suggested to account for experimental observations of the oxidation kinetics and the oxide morphology below 1000 °C. |
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Keywords: | Nickel A High-temperature oxidation C Oxidation kinetics C Oxide morphology Oxidation mechanism |
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