| 3%NaCl溶液中铜的表面膜及BTA膜的光电化学研究 |
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| 引用本文： | 任聚杰,杨迈之.3%NaCl溶液中铜的表面膜及BTA膜的光电化学研究[J].中国腐蚀与防护学报,1995,15(3):237-240. |
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| 作者姓名： | 任聚杰 杨迈之 |
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| 作者单位： | 河北医学院，北京大学，河北师范大学 |
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| 基金项目： | 国家教委优秀年轻教师基金 |
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| 摘 要： | ３％ＮａＣｌ溶液中铜的表面膜及ＢＴＡ膜的光电化学研究任聚杰，杨迈之，童汝亭，蔡生民（河北医学院石家庄０５００１７）（北京大学北京１００８７１）（河北师范大学石家庄０５００１６）１引言人们已经注意到Ｃｌ－对Ｃｕ有腐蚀作用［１，２］，关于ＢＴＡ对Ｃｕ的缓...
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| 关 键 词： | 铜 BTA膜 光电化学 氯化钠溶液 |
PHOTOELECTROCHEMICAL STUDY ON SURFACE FILM OF COPPER FORMED IN 3% NaCl SOLUTION CONTAINING BTA |
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| Ren Jujie,Yang Maizhi,Tong Ruting,Cai Shengmin.PHOTOELECTROCHEMICAL STUDY ON SURFACE FILM OF COPPER FORMED IN 3% NaCl SOLUTION CONTAINING BTA[J].Journal of Chinese Society For Corrosion and Protection,1995,15(3):237-240. |
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| Authors: | Ren Jujie Yang Maizhi Tong Ruting Cai Shengmin |
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| Affiliation: | Ren Jujie;Yang Maizhi;Tong Ruting;Cai Shengmin(Hebei Medical College)(Beijing University)(Hebei Normal University) |
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| Abstract: | The corrosion behavior of copper and the inhibition of BTA for copper in 3% NaCl solution have been investigated by photo-electrochemical and XPS met hods. The results show that the surface film of copper in the solution is composed of Cu(I),O2-and Cl-However,CuCl has not been found as the primary component in the surfaCe film.The inhibition of BTA could be attributed to the formation of a protective and adsorptive film on Cu2O.The adsorption of BTA does not change the semiconductive properties of Cu2O on copper. |
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| Keywords: | Photoelectrochemistry Copper Surface film BTA |
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