Dopant profile and gate geometric effects on polysilicon gatedepletion in scaled MOS

Polysilicon depletion effects show a strong gate length dependence according to experimental p-channel MOS capacitance-voltage (C-V) data. The effect can be influenced not only by gate geometries, but also by dopant profiles in poly-gates. These effects have been modeled and verified using device simulation. Nonuniform dopant distributions in the vertical and lateral direction in the poly-gate cause additional potential drops. The potential drop in the poly-gate becomes critical as the gate geometry is scaled down due to edge and corner depletions resulting from fringing electric fields