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沉积气压对电弧离子镀制备MgO薄膜的结构及性能的影响
引用本文:朱道云,郑昌喜,王明东,陈弟虎,何振辉. 沉积气压对电弧离子镀制备MgO薄膜的结构及性能的影响[J]. 功能材料, 2011, 42(7)
作者姓名:朱道云  郑昌喜  王明东  陈弟虎  何振辉
作者单位:1. 广东工业大学实验教学部,广东广州510006 中山大学物理科学与工程技术学院,广东广州510275
2. 中山大学物理科学与工程技术学院,广东广州,510275
基金项目:国家高技术研究发展计划(863计划)资助项目(2003AA311122); 广东工业大学博士启动资助项目(083025)
摘    要:
采用阴极真空电弧离子沉积技术在玻璃及Si衬底上成功地制备了具有择优结晶取向的透明MgO薄膜。利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)及紫外-可见吸收光谱仪分别对MgO薄膜微观结构、表面形貌及可见光透过率进行了测试与分析。XRD结果表明,所制备的MgO薄膜具有NaCl型立方结构的(100)、(110)和(111)3种结晶取向,在沉积气压为0.7~3.0Pa的范围内,薄膜的择优结晶取向随沉积气压的升高先由(100)转变为(110),最后变为(111)。SEM图表明随着沉积气压的升高,MgO薄膜的晶粒逐渐变小,薄膜结晶质量变差。在380~900nm范围内,沉积气压为0.7Pa下制备的MgO薄膜其可见光透过率高于90%,随着沉积气压的升高,薄膜的可见光透过率有所下降。

关 键 词:阴极真空电弧离子沉积  沉积气压  MgO薄膜  等离子体显示板

Influences of deposition pressure on the structure and properties of MgO thin films prepared by cathodic vacuum arc deposition
ZHU Dao-yun,,ZHENG Chang-xi,WANG Ming-dong,CHEN Di-hu,HE Zhen-hui. Influences of deposition pressure on the structure and properties of MgO thin films prepared by cathodic vacuum arc deposition[J]. Journal of Functional Materials, 2011, 42(7)
Authors:ZHU Dao-yun    ZHENG Chang-xi  WANG Ming-dong  CHEN Di-hu  HE Zhen-hui
Affiliation:ZHU Dao-yun1,2,ZHENG Chang-xi2,WANG Ming-dong2,CHEN Di-hu2,HE Zhen-hui2(1.Experiment Teaching Department,Guangdong University of Technology,Guangzhou 510006,China,2.School of Physics and Engineering,Sun Yat-sen University,Guangzhou 510275,China)
Abstract:
MgO thin films with preferred orientation and high optical transparence were prepared on the slide-glasses and Si substrates by the cathodic vacuum arc ion deposition.X-ray diffraction(XRD),scanning electron microscopy(SEM) and UV-visible spectrophotometer were used to investigate the influences of deposition pressure on the crystal structure,the morphology and the properties of MgO thin films,respectively.XRD patterns indicated that MgO thin films had a NaCl-type cubic structure and the film preferred orie...
Keywords:cathodic vacuum arc ion deposition  deposition pressure  MgO thin films  plasma display panel  
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