High-speed small-scale InGaP/GaAs HBT technology and itsapplication to integrated circuits |
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Authors: | Oka T. Hirata K. Suzuki H. Ouchi K. Uchiyama H. Taniguchi T. Mochizuki K. Nakamura T. |
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Affiliation: | Central Res. Lab., Hitachi Ltd., Tokyo; |
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Abstract: | We have developed the advanced performance, small-scale InGaP/GaAs heterojunction bipolar transistors (HBTs) by using WSi/Ti base electrode and buried SiO2 in the extrinsic collector. The base-collector capacitance CBC was further reduced to improve high-frequency performance. Improving the uniformity of the buried SiO 2, reducing the area of the base electrode, and optimizing the width of the base-contact enabled us to reduce the parasitic capacitance in the buried SiO2 region by 50% compared to our previous devices. The cutoff frequency fT of 156 GHz and the maximum oscillation frequency fmax of 255 GHz were obtained at a collector current IC of 3.5 mA for the HBT with an emitter size SE of 0.5×4.5 μm2, and fT of 114 GHz and fmax of 230 GHz were obtained at IC of 0.9 mA for the HBT with SE of 0.25×1.5 μm2. We have also fabricated digital and analog circuits using these HBTs. A 1/8 static frequency divider operated at a maximum toggle frequency of 39.5 GHz with a power consumption per flip-flop of 190 mW. A transimpedance amplifier provides a gain of 46.5 dB·Ω with a bandwidth of 41.6 GHz at a power consumption of 150 mW. These results indicate the great potential of our HBTs for high-speed, low-power circuit applications |
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