Hot-carrier-induced on-resistance degradation of step gate oxide NLDMOS |
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Authors: | Han Yan Zhang Bin Ding Koubao Zhang Shifeng Han Chenggong Hu Jiaxian Zhu Dazhong |
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Affiliation: | Institute of Microelectronics & Photoelectronics, Zhejiang University, Hangzhou 310027,China |
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Abstract: | The hot-carrier-induced on-resistance degradations of step gate oxide NLDMOS (SG-NLDMOS) transistors are investigated in detail by a DC voltage stress experiment,a TCAD simulation and a charge pumping test.For different stress conditions,degradation behaviors of SG-NLDMOS transistors are analyzed and degradation mechanisms are presented.Then the effect of various doses of n-type drain drift (NDD) region implant on Ron degradation is investigated.Experimental results show that a lower NDD dosage can reduce the hot-carrier induced Ron degradation effectively,which is different from uniform gate oxide NLDMOS (UG-NLDMOS) transistors. |
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Keywords: | SG-NLDMOS Ron degradation charge-pumping interface state positive oxide-trapped charge |
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