Site-specific and patterned growth of TiO(2) nanotube arrays from e-beam evaporated thin titanium film on Si wafer |
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Authors: | Karumbaiah N Chappanda York R Smith Mano Misra Swomitra K Mohanty |
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Affiliation: | Electrical and Computer Engineering Department, University of Utah, Salt Lake City, UT 84112, USA. |
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Abstract: | Growth of TiO(2) nanotubes on thin Ti film deposited on Si wafers with site-specific and patterned growth using a photolithography technique is demonstrated for the first time. Ti films were deposited via e-beam evaporation to a thickness of 350-1000?nm. The use of a fluorinated organic electrolyte at room temperature produced the growth of nanotubes with varying applied voltages of 10-60?V (DC) which remained stable after annealing at 500?°C. It was found that variation of the thickness of the deposited Ti film could be used to control the length of the nanotubes regardless of longer anodization time/voltage. Growth of the nanotubes on a SiO(2) barrier layer over a Si wafer, along with site-specific and patterned growth, enables potential application of TiO(2) nanotubes in NEMS/MEMS-type devices. |
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