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Effect of temperature on the formation of surface layers in plasma-assisted chemical vapour deposition processes carried out in an atmosphere containing Ti(OiC3H7)4 vapours |
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| Authors: | J. R. Sobiecki T. Wierzchon B. Kułakowska-Pawlak W. Żyrnicki |
| Affiliation: | (1) Faculty of Materials Science and Engineering, Warsaw University of Technology, 02-524 Warszawa, Narbutta 85, Poland;(2) Institute of Inorganic Chemistry and Metallurgy of Rare Elements, Wroc!["lstrok"]("/content/u423320681k53060/xlarge322.gif") aw Technical University, 50-370 Wrocaw, Poland |
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