| ZnS薄膜沉积过程的基材效应 |
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| 引用本文： | 徐均琪,苏俊宏,梁海锋,惠迎雪. ZnS薄膜沉积过程的基材效应[J]. 真空科学与技术学报, 2011, 31(3): 262-266. DOI: 10.3969/j.issn.1672-7126.2011.03.03 |
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| 作者姓名： | 徐均琪 苏俊宏 梁海锋 惠迎雪 |
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| 作者单位： | 西安工业大学陕西省薄膜技术与光学检测重点实验室,西安,710032 |
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| 基金项目： | 科技部国际合作项目，陕西省国际科技合作重点项目 |
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| 摘 要： | 采用热蒸发及离子束辅助沉积技术制备了单层ZnS薄膜,研究了Si、Ge、K9及石英玻璃基材对薄膜沉积速率及光学特性的影响。采用椭偏法拟合了薄膜的厚度和折射率,分析了不同基材上沉积薄膜的色散特性。研究结果表明,薄膜的生长存在明显的基材效应,无论室温沉积、基温200℃,还是采用离子束辅助沉积,石英基材上均具有最高的沉积速率。室温沉积时,4种基材上薄膜的沉积速率差为3.3 nm/min,加热进一步扩大了这种差异(5.2 nm/min),而离子束辅助则在一定程度上缩小了这种差异(1.86 nm/min)。在室温下,石英基材上沉积的ZnS薄膜具有最低的折射率,其他几种基材上折射率差异不大。加热会使Si、Ge及K9玻璃上的折射率差异变大,与石英玻璃上薄膜折射率差异减小,离子源的使用则进一步缩小了这种差异。透射率光谱测试证实了这一结果。
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| 关 键 词： | 基材效应 ZnS 薄膜 折射率 厚度 |
Influence of Substrate Material on Growth of ZnS Films |
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| Xu Junqi,Su Junhong,Liang Haifeng,Xi Yingxue. Influence of Substrate Material on Growth of ZnS Films[J]. JOurnal of Vacuum Science and Technology, 2011, 31(3): 262-266. DOI: 10.3969/j.issn.1672-7126.2011.03.03 |
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| Authors: | Xu Junqi Su Junhong Liang Haifeng Xi Yingxue |
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| Affiliation: | Xu Junqi,Su Junhong,Liang Haifeng,Xi Yingxue (Shaanxi Province Thin Film Technology and Optical Test Open Key Laboratory,Xi'an Technological University,Xi'an 710032,China) |
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| Abstract: | The ZnS films were grown by thermal evaporation and ion beam assisted deposition(IBAD) on substrates of silicon,germanium,quartz,and K9 glass,respectively.The impacts of the growth conditions,including the substrate materials,substrate temperature,and deposition rate,on the growth,microstructures and properties of the ZnS films were studied.The results show that the substrate species and temperature strongly affect the growth and properties of ZnS films.For instance,when it comes to deposition rates,quartz ... |
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| Keywords: | Substrate effect ZnS Film Refractive index Thickness |
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