Advanced technologies for optimized sub-quarter-micrometer SOI CMOSdevices

Two manufacturable technologies of fully-depleted (FD) thin-film silicon-on-insulator (SOI) MOSFET's for low-power applications are proposed in this paper. To maintain high current drive while aggressively thinning down the SOI film, silicide is to be formed on Ge-damaged silicon layers. Ge preamorphization facilitates silicide formation at low temperature (~450°C) and effectively controls the silicide depth without void formation. It also reduces the floating body effect. In addition, a reliable gate work-function engineering is introduced for good threshold voltage management. A p⁺SiGe/Si stack gate alleviates the threshold voltage instability of SOI due to film thickness nonuniformity and broadens the design window for channel doping. These advanced technologies, compatible with existing bulk CMOS technology, are integrated into SOI CMOS process. Excellent electrical device results are presented