| 磁控溅射技术进展及应用(上) |
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| 引用本文： | 徐万劲. 磁控溅射技术进展及应用(上)[J]. 现代仪器, 2005, 11(5): 1-5 |
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| 作者姓名： | 徐万劲 |
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| 作者单位： | 北京大学物理学院,北京,100871 |
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| 基金项目： | 硅基发光研究项目得到国家自然科学基金委员会光电重大计划重点项目90201037资助 |
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| 摘 要： | 近年来磁控溅射技术的应用日趋广泛,在工业生产和科学研究领域发挥巨大作用。随着对具有各种新型功能的薄膜需求的增加,相应的磁控溅射技术也获得进一步的发展。本文将介绍磁控溅射技术的发展,以及闭合磁场非平衡溅射、高速率溅射及自溅射、中频及脉冲溅射等各种新技术及特点,阐述磁控溅射技术在电子、光学、表面功能薄膜、薄膜发光材料等许多方面的应用。
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| 关 键 词： | 磁控管 溅射率 非平衡磁控溅射 闭合场非平衡磁控溅射 自溅射 |
Recent developments and applications in magnetron sputtering |
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| Xu Wanjin. Recent developments and applications in magnetron sputtering[J]. Modern Instruments, 2005, 11(5): 1-5 |
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| Authors: | Xu Wanjin |
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| Affiliation: | School of Physics, Peking University, Beijing, 100871 |
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| Abstract: | Magnetron sputtering is a widely used method for thin film deposition in recent years, which makes a great impact on the industrial production and scientific research. Magnetron technology is continuously developing because new advanced films with specific functional properties are needed. The paper will describe the development of magnetron technology and novel technologies such as closed-field unbalanced magnetron sputtering, High-rate magnetmn sputtering, sustained self-sputtering, AC or medium frequency sputtering and pulsed sputtering. The application of magnetron sputtering in electronics, optics, surface engineering and electroluminescent component will be shown. |
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| Keywords: | Magnetron Sputtering yield Unbalanced magnetron sputtering Closed-field Unbalanced magnetron sputtering Sustained self-sputtering |
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