| 一种掩模版制版用夹具装置的研制 |
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| 引用本文： | 李玉敏. 一种掩模版制版用夹具装置的研制[J]. 电子工业专用设备, 2010, 39(11): 49-51 |
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| 作者姓名： | 李玉敏 |
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| 作者单位： | 中国电子科技集团公司第四十五研究所,北京,101601 |
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| 摘 要： | 介绍了一种掩模版制版用夹具装置,该装置具有准确的定位功能,能够自动补偿片厚误差,可进行真空复印使母掩模版与子掩模版紧密贴附,操作方便等特点。
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| 关 键 词： | 制版 定位 片厚补偿 真空复印 |
The Chuck Fitting Research Used in Mask Reprinting |
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| LI Yumin. The Chuck Fitting Research Used in Mask Reprinting[J]. Equipment for Electronic Products Marufacturing, 2010, 39(11): 49-51 |
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| Authors: | LI Yumin |
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| Affiliation: | LI Yumin(The 45th Research Institute of CECT,Beijing 101601,China) |
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| Abstract: | The paper introduces one kind of chuck fitting used in mask lithography and the characters of the fitting are as following: having the function of positioning precisely,compensating the thickness error of mask automatically,contacting mother mask and sub mask tightly by pumping vacuum,operating conveniently. |
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| Keywords: | Lithography Positioning Mask thickness compensation Vacuum printing |
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