Deep-level transient spectroscopy of detector-grade high-resistivity float-zone silicon |
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Authors: | E. Simoen K. De Backker C. Claeys P. Clauws |
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Affiliation: | (1) IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;(2) Laboratorium voor Kristallografie en Studie van de Vaste Stof, Krijgslaan 281-S1, B-9000 Gent, Belgium |
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Abstract: | ![]() In this paper, the application of standard capacitance DLTS to high-resistivity (HR) silicon is investigated both theoretically and experimentally. As will be demonstrated, typical artefacts occur, which are related to the low doping density of the material (order of a few times 1011 to 1012 cm-3). The high series resistance of a HR-Si diode gives rise to the so-called Q-effect, yielding a reduction of the DLTS peak amplitude, which is particularly pronounced at room temperature and for p-type material. A second effect is the occurrence of non-negligible re-emission during the filling pulse, which causes the Arrhenius plot to deviate from a straight line and is particularly important for repulsive trapping centres. Methods will be discussed to reduce or correct for these phenomena. They will be illustrated by the practical example of the interstitial Fe donor-level in p-type HR-Si. |
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Keywords: | Si DLTS low doping density |
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