| 纳米加工和纳米电子器件 |
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| 引用本文： | 刘明,谢常青,王丛舜,龙世兵,李志钢,易里成荣,涂德钰.纳米加工和纳米电子器件[J].微纳电子技术,2005,42(9):393-397. |
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| 作者姓名： | 刘明 谢常青 王丛舜 龙世兵 李志钢 易里成荣 涂德钰 |
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| 作者单位： | 中国科学院微电子研究所,纳米加工与新器件集成实验室,北京,100029 |
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| 基金项目： | 国家自然基金资助项目(60276019,90207004,60236010,60290081) |
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| 摘 要： | 介绍了电子束曝光技术、EUV光刻技术和X射线光刻技术的进展;对各种纳米电子器件如单电子器件、共振隧穿器件和分子电子器件的研究现状及面临的主要挑战进行了讨论。
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| 关 键 词： | 自上而下的纳米加工 纳米器件 单电子器件 共振隧穿器件 |
| 文章编号： | 1671-4776(2005)09-0393-05 |
| 修稿时间： | 2005年7月5日 |
Nano-Fabrication and Nano-Electron Devices |
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| LIU Ming,XIE Chang-qing,WANG Cong-shun,LONG Shi-bing,LI Zhi-gang,YILI Cheng-rong,TU De-yu.Nano-Fabrication and Nano-Electron Devices[J].Micronanoelectronic Technology,2005,42(9):393-397. |
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| Authors: | LIU Ming XIE Chang-qing WANG Cong-shun LONG Shi-bing LI Zhi-gang YILI Cheng-rong TU De-yu |
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| Affiliation: | LIU Ming,XIE Chang-qing,WANG Cong-shun,LONG Shi-bing,LI Zhi-gang,YILI Cheng-rong,TU De-yu Laboratory of Nona-Fabrication and New Devices Integration,Institute of Microelectronics of Chinese Academy of Sciences,Beijing 100029,China |
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| Abstract: | Some progress on top-down nano-fabrication, such as electron beam lithography,X-ray lithography and EUV lithography were introduced. The progress and challenge on quantum mechanism nano-devices such as SET, RTD and molecular device were also investigated. |
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| Keywords: | top-down nano-fabrication nano-devices single electron devices resonant tunneling devices |
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