Nanoscale Studies of the Early Stages of Oxidation of a TiAl-Base Alloy

The strategy to perform nanoscale studies of the initial stages of oxidation of TiAl involved first gaining some information on the electronic structure of pure TiO₂ surfaces and then on TiAl surfaces before and after oxidation both in low- and high-oxygen potentials. Both materials were studied in atomically-cleaned states generated by repeated sputtering and heating. It was found that the oxygen vacancies created additional defect states in the band gap of stoichiometric TiO₂. The results obtained on TiO₂ were used as fingerprints to study the oxide nucleation. The results on the initial stages of oxidation of TiAl confirm the nucleation of Ti₂O₃ islands of nanometer size and monolayer height in a low-oxygen-pressure environment, whilst a TiO₂ layer developed in an atmospheric environment. The ledges on atomically-cleaned surfaces usually acted as nucleation sites.