Surface-initiated growth of copper using isonicotinic acid-functionalized aluminum oxide surfaces |
| |
Authors: | Cathren E Gowenlock Virginia Gomez James D McGettrick Enrico Andreoli Andrew R Barron |
| |
Affiliation: | 1.Energy Safety Research Institute (ESRI), College of Engineering,Swansea University,Wales,UK;2.SPECIFIC, Baglan Bay Innovation & Knowledge Centre, College of Engineering,Swansea University,Wales,UK;3.Department of Chemistry and Department of Materials Science and Nanoengineering,Rice University,Houston,USA |
| |
Abstract: | Isonicotinate self-assembled monolayers (SAM) were prepared on alumina surfaces (A) using isonicotinic acid (iNA). These functionalized layers (iNA-A) were used for the seeded growth of copper films (Cu-iNA-A) by hydrazine hydrate-initiated electroless deposition. The films were characterized by scanning electron microscopy (SEM), electron-dispersive X-ray spectroscopy, atomic force microscopy, X-ray photoelectron spectroscopy, X-ray diffraction, and advancing contact angle measurements. The films are Cu0 but with surface oxidation, and show a faceted morphology, which is more textured (R q = 460 ± 90 nm) compared to the SAM (R q = 2.8 ± 0.5 nm). In contrast, growth of copper films by SnCl2/PdCl2 catalyzed electroless deposition, using formaldehyde (CH2O) as the reducing agent, shows a nodular morphology on top of a relatively smooth surface. No copper films are observed in the absence of the isonicotinate SAM. The binding of Cu2+ to the iNA is proposed to facilitate reduction to Cu0 and create the seed for subsequent growth. The films show good adhesion to the functionalized surface. |
| |
Keywords: | |
本文献已被 SpringerLink 等数据库收录! |
|