The effects of pulse frequency and substrate bias to the mechanical properties of CrN coatings deposited by pulsed DC magnetron sputtering |
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| Affiliation: | 1. Department of Materials Engineering, Ming Chi University of Technology, New Taipei City, Taiwan;2. Center for Thin Films Technologies and Applications, Ming Chi University of Technology, New Taipei City, Taiwan;3. Chemistry Division, Center for General Education, Chang Gung University, Taoyuan, Taiwan;4. Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan;5. Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan;6. Department of Mechanical Engineering, Institute of Materials Science and Engineering, National Central University, Chung-Li, Taiwan;1. College of Physics and Materials Science, Tianjin Normal University, No. 393 Binshuixi Road, Tianjin 300387, China;2. Tianjin International Joint Research Centre of Surface Technology for Energy Storage Materials, Tianjin Normal University, No. 393 Binshuixi Road, Tianjin 300387, China;1. Institute of Advanced Wear & Corrosion Resistant and Functional Materials, Jinan University, China;2. Department of Materials Engineering, Ming Chi University of Technology, Taiwan;3. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, Taiwan |
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| Abstract: | The chromium nitride coatings have been prepared by the bipolar symmetric pulsed DC magnetron reactive sputtering process at 2 kHz and 20 kHz pulse frequencies, respectively. Different substrate bias was applied with a pulsed DC bias unit with 50 kHz pulse frequency. Oscilloscope traces of the I–V waveforms indicate high power and high current density outputs during the symmetric bipolar pulsed mode. It is concluded that the (200) orientation of CrN films is observed. The grain size decreases with increasing pulse frequency and substrate bias. The substrate bias has a strong influence on the mechanical properties of CrN films. The scratch tests of the CrN coatings show that almost only tiny chipping failure is occurred. Sufficient adhesion strength quality of the coating is also observed. The substrate bias for the deposition of CrN films with sufficient hardness and adhesion properties combination is − 290 V at 20 kHz and − 408 V at 2 kHz pulse frequency, respectively. |
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