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THE SULFUR INCORPORATION AND THE GROWTH OF GaAs SUBMICROMETER EPILAYERS IN Ga-AsCl_3-H_2 SYSTEM
作者姓名:彭瑞伍  孙裳珠  沈松华
作者单位:Shanghai Institute of Metallurgy Academia Sinica,Shanghai Institute of Metallurgy,Academia Sinica,Shanghai Institute of Metallurgy,Academia Sinica
摘    要:Submicrometer epilayers have been grown in Ga-AsCl_3-H_2 system using elemental sulfur as adopant.The mechanism of sulfur incorporation was discussed on the basis of surface adsorption.Ithas been shown that the electrical properties of single epilayers are typically n=1-2×10~(17)/cm~3,thick-ness 0.4 μm and breakdown voltage about 7—10V.The width of interface region in single andmultilayer structures is about 0.1μm.The epilayers obtained have been used to fabricate the microwave devices,such as Gunn diodes,varactors,and far infrared detectors.

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