Enhancement of the dielectric properties of Pb(La,Ti)O3 thin films fabricated by pulsed laser deposition

PLT thin films with a thickness of 600 nm were grown by pulsed laser deposition (PLD) using different laser wavelengths of 355, 532 and 1064 nm, respectively. We have systematically investigated the variation of grain sizes depending on the process condition. A two-step process to grow (Pb_0.72La_0.28)Ti_0.93O₃ (PLT) films was adopted and verified to be useful to enlarge the grain size of the film and to enhance leakage current characteristics. Structural and electrical properties including dielectric constant, ferroelectric characteristics, and leakage current of PLT thin films were shown to be strongly influenced by grain size.