真空弧离子源脉冲工作瞬间的放电行为

采用高速摄影和光谱诊断的方法研究了真空弧离子源脉冲工作瞬间的放电行为。拍摄了离子源放电瞬间吸氢电极上阴极斑的形成过程，分析了不同放电电流时阴极斑的发射光谱。实验结果表明，当脉冲工作电流为10^1—10^2A时，真空弧离子源放电区一般只有单个阴极斑，阴极斑的位置在同一次放电中的变化很小；较大的脉冲工作电流有利于提高阴极斑的温度，并最终导致氢离子浓度的增加，但也会使阴极材料的溅射更加严重，造成离子源等离子体品质下降。

Discharge behavior of vacuum arc ion source working in pulse mode

Discharge behavior of the vacuum arc ion source working in pulse mode was investigated using high-speed photography and spectrum diagnosis. The evolvement of cathode spot on hydrogen-impregnated electrode was captured by high-speed photography, and the emission spectra of cathode spot at different pulse currents were analyzed. The experimental results show that in most cases, only one cathode spot can be found in the discharge zone of vacuum arc ion source, and the spot moves a little during the same discharge. Temperature of the cathode spot may rise while the discharge current increases, and ultimately the density of hydrogen ion will be increased. At the same time, sputtering of the electrode is enhanced and the quality of ion plasma will be reduced.