Introduction of helium into metals by magnetron sputtering deposition method |
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| Affiliation: | 1. Institute of Metal Research, The Chinese Academy of Sciences, Shenyang 110016, China;2. Institute of Modern Physics, Fudan University, Shanghai 200433, China;1. North Carolina State University/Triangle Universities NuclearLaboratory, Raliegh 27695, USA;2. Los Alamos National Laboratory, Los Alamos 87545, USA;1. Laboratory for Thermalhydraulics, Nuclear Energy and Safety Department, Paul Scherrer Institut, CH-5232 Villigen PSI, Switzerland;2. Physikalisch-Technische Bundesanstalt (PTB), 38116 Brausnchweig, Germany;3. Soreq NRC, Yavne 81800, Israel;4. Swiss Federal Institute of Technology Zurich, Sonnegstrasse 3, CH-8092 Zurich, Switzerland |
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| Abstract: | High concentration helium, up to 16 at.%, was introduced into Ti films through magnetron sputtering method in a He/Ar complex atmosphere. The introduced helium distributes homogeneously in the films and mainly forms small helium bubbles. Helium thermodesorption experiments were carried out, from which it was found that the thermodesorption properties of the introduced 4He are similar to those of radiogenic 3He in titanium tritides. Titanium alloy films containing helium were also prepared through this way and a comparison of thermodesorption properties was made between them and Ti–He films. |
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