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Electron beam damage of behenic acid films
Authors:Tamotsu Ohno
Affiliation:Department of Physics, Aichi Medical University, Nagakute-cho, Aichi-ken 480-11, Japan
Abstract:The rate of fading of electron diffraction patterns of behenic acid monolayer crystals as well as multilayer crystals was measured at 100 kV at room temperature to investigate the dependence of beam damage on specimen thickness. The diffracted intensities for monolayers and double layers decreased nearly exponentially with electron exposure; however, the intensities for multilayers were unchanged during initial electron exposures, often increased temporarily and then decreased with electron exposure. The critical dose, De, defined as the dose at which the diffracted intensity falls to 1/e of its initial value, was 1.0 electrons/Å2 for the monolayers, 1.8 electrons/Å2 for the double layers and more for multilayers. These results lead to the conclusion that De for behenic acid increases nearly linearly with specimen thickness in the range of about 25–100 Å for dose rate of 0.1–2 electrons/Å2 min.
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