双材料微悬臂梁结构设计及工艺参数优化

针对国内在双材料微悬臂梁焦平面阵列方面的研究仅限于无基底情况,提出并设计了以K9玻璃为基底,规模为120×120,器件单元大小为40μm×40μm,且基于牺牲层技术的双材料微悬臂梁阵列结构.分别采用旋涂法、等离子体增强型化学气相沉积和光刻技术制备牺牲层和红外吸收层,以及各层的图形化.并对器件制备过程中各阶段的工艺参数进行了优化,其中旋涂法转速为3 000r/min;等离子体增强型化学气相沉积技术沉积制备氮化硅薄膜方面,当基片温度350℃、射频功率100 W、反应压强70Pa、SiH4流量40mL/min、N2流量60mL/min时薄膜特性最佳.

Structure Design of Bi-material Micro-cantilever and the Optimization of Process Parameters

The domestic research is limited to bi-material micro-cantilever focal plane array without substrate,a new design on K9glass substrate is proposed.The scale is 120＊120and the size of device is 40 μ m＊40 μ m.The preparation of this bi-material micro-cantilever array is based on the sacrificial layer,which is prepared by the spin-coating method.In addition,the infrared absorption layer is fabricated by PECVD and each patterned layer is based on photolithography.Though optimizing the process parameters of each stage,the film presents a excellent property,while the rotate speed is 3000r/min for spin-coating method,the temperature of substrates is 350 ℃,the RF power is 100 W,the pressure of reaction is 70Pa,the flow of SiH4 is 40 mL/min and the flow of N2 is 60 mL/min for PECVD.