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Enhanced photoreactivity of MOFs by intercalating interlayer bands via simultaneous ?NCO and ?SCu modification
Authors:Wei-Fei Hu  Shuo Chen  Hong-Chao Hao  Hong Jiang
Affiliation:1. Department of Applied Chemistry, University of Science and Technology of China, Hefei, China

Contribution: Conceptualization (lead), ​Investigation (lead), Resources (equal), Writing - original draft (lead);2. Department of Applied Chemistry, University of Science and Technology of China, Hefei, China

Contribution: Data curation (equal), ​Investigation (supporting), Validation (equal);3. Department of Applied Chemistry, University of Science and Technology of China, Hefei, China

Contribution: Formal analysis (equal), ​Investigation (supporting), Resources (supporting);4. Department of Applied Chemistry, University of Science and Technology of China, Hefei, China

Abstract:Herein, we propose a novel method to enhance the photoreactivity of an MOF catalyst by grafting isocyanate bonds ( NCO) and sulfhydryl-complexed copper ( SCu) onto ZIF-8 (NIF-SCu). The grafting process intercalated interlayer bands between the conduction and valence bands of ZIF-8, thereby providing a “ladder” for facile electron transition. The extreme improvement in the photoreactivity of NIF-SCu could be attributed to the enhancement in light responses in the range of 350–450 nm by  NCO groups and the widening of the visible light range of the MOF by  SCu groups. The formation of staggered energy levels in NIF-SCu could also narrow the band gap, lower the resistance, and facilitate the transfer of photogenerated carriers, thereby generating electrons with strong reduction potential in the  SCu conduction band. This study provides a new strategy for improving or even endowing the photoactivity of environmental functional materials with wide bandgaps.
Keywords:metal-organic framework  modification  photoactivity  sulfamethoxazole  ZIF-8
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