| 真空-压力浸渍设备的研制 |
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| 引用本文： | 申璐青,张慧军,段青鹏,耿涛. 真空-压力浸渍设备的研制[J]. 电子工业专用设备, 2013, 0(6): 5-8 |
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| 作者姓名： | 申璐青 张慧军 段青鹏 耿涛 |
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| 作者单位： | 中国电子科技集团公司第二研究所 |
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| 摘 要： | 真空-压力浸渍设备主要用于无线电元件、电器产品的真空加压浸渍,是现代电子产业高标准,高要求所必需的生产设备。介绍了真空-压力浸渍设备在工业浸渍中所应实现的功能流程,以及此设备的主要技术指标,介绍了其主要的机械结构设计,最后对整个设备的控制系统和软件设计也作了简单总结。
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| 关 键 词： | 真空-压力浸渍 薄膜脱气 PLC控制 |
The Development of the Vacuum - pressure Impregnation Equipment |
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| SHEN Luqing,ZHANG Huijun,DUAN Qingpeng,GENG Tao. The Development of the Vacuum - pressure Impregnation Equipment[J]. Equipment for Electronic Products Marufacturing, 2013, 0(6): 5-8 |
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| Authors: | SHEN Luqing ZHANG Huijun DUAN Qingpeng GENG Tao |
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| Affiliation: | (The 2nd Research Institute of CETC,Taiyuan 030024,China) |
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| Abstract: | Vacuum-pressure impregnation equipment is mainly used for radio components, electrical products, vacuum pressure impregnation, high standards of modem electronics industry, demanding the necessary production equipment. This paper introduces the vacuum - pressure impregnation equipment in industrial impregnation processes that should be implemented functionality, as well as major technical indicators for this device. Then describes in detail the main mechanical structure design, and finally the whole equipment control system and software design are also briefly summarized. |
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| Keywords: | The vacuum-pressure impregnation： Thin film degasification PLC control |
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