LPE growth of InP/InGaAsP/InP heterostructures and separate preparation of high-temperature solutions

We describe a process for separate preparation of high-temperature solutions, which includes a prolonged preannealing (synthesis) at elevated temperatures. This process enables liquid phase epitaxy (LPE) of InGaAsP with highly reproducible physical properties (layer thickness, photoluminescence wavelength, and lattice parameter) and electrical characteristics (current-power curve, dark current, output power, emission wavelength, and threshold and working currents). Using this process, InP/InGaAsP/InP heterostructures can be grown by LPE in a wide temperature range (480–680°C) with highly reproducible parameters, for both photodetectors and light-emitting devices. An original LPE process is proposed which takes advantage of the separate preparation and pouring of high-temperature solutions with the use of graphite equipment.