|
|||||
|
|
| 硅吸除技术 | |
| 引用本文： | 蒋荣华 梁李成. 硅吸除技术[J]. 半导体光电, 1990, 11(3): 289-296 |
| 作者姓名： | 蒋荣华 梁李成 |
| 作者单位： | 峨眉半导体材料厂、所，峨眉半导体材料厂、所，峨眉半导体材料厂、所 四川峨眉 614200，四川峨眉 614200，四川峨眉 614200 |
| 摘 要： | 本文详细地叙了各种硅吸除技术;阐明了非本征吸除、本征吸除和综合吸除的机理和工艺。举例说明了吸除技术的应用。 |
| 关 键 词： | 硅 吸除技术 单晶材料 工艺 |
Silicon Gettering Technique |
|
| Jiang Ronghua Liang Licheng Xiao Shunzhen Emei Semiconductor Material Factory and Research Institute Emei,Sichuan. Silicon Gettering Technique[J]. Semiconductor Optoelectronics, 1990, 11(3): 289-296 | |
| Authors: | Jiang Ronghua Liang Licheng Xiao Shunzhen Emei Semiconductor Material Factory Research Institute Emei Sichuan |
| Affiliation: | Jiang Ronghua Liang Licheng Xiao Shunzhen Emei Semiconductor Material Factory and Research Institute Emei,Sichuan 614200 |
| Abstract: | Various kinds of silcon gettering techiques as well as the mechanism and technology are described in detail such as extrinsic,intrinsic and synthetic getter- ings.Examples are given.demonstrating the applications of the above gettering tech- niques. |
| Keywords: | Silicon Gettering Technique |
| 本文献已被 CNKI 维普 等数据库收录！ | |