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纳米微孔SiO2薄膜的Sol—Gel制备及气孔率控制
引用本文:方国家 姚凯伦. 纳米微孔SiO2薄膜的Sol—Gel制备及气孔率控制[J]. 功能材料, 1999, 30(2): 190-192
作者姓名:方国家 姚凯伦
作者单位:[1]华中理工大学物理系 [2]中国科学院国际材料物理中心
基金项目:英国帝国理工学院访问学者基金
摘    要:本文报道了纳米微孔SiO2薄膜的溶胶-凝胶(sol-gel)制备工艺,利用椭圆偏振光测试仪(Ellipsometer)直接测量了薄膜的厚度、折射率、从而得到了SiO2薄膜的气孔率及气孔大小分布。研究了合成工艺条件及浓H2SO4表面修饰对SiO2薄膜气孔率及稳定性的影响。

关 键 词:纳米微孔 sol-gel 薄膜 气孔率控制 二氧化硅

Preparation of Nanometer Porous Silica Thin Films by the Sol-Gel Technique and Their Porosity Control
FANG Guojia,LIU Zuli,YAO Kailun,, Dept. of Physics,Huazhong Univ. of Sci , Tech.,Wuhan,,China, International Center for Material Physics,Chinese Academy of Sciences,Shenyang,,China, CCAST. Preparation of Nanometer Porous Silica Thin Films by the Sol-Gel Technique and Their Porosity Control[J]. Journal of Functional Materials, 1999, 30(2): 190-192
Authors:FANG Guojia  LIU Zuli  YAO Kailun     Dept. of Physics  Huazhong Univ. of Sci & Tech.  Wuhan    China   International Center for Material Physics  Chinese Academy of Sciences  Shenyang    China   CCAST
Abstract:In this paper,we have reported the fabrication techniques of nanometer porous silica thin films prepared by the sol-gel method.Thickness,refractive indices,porosity and pore size distribution have been characterized by the molecule probe ellipsometry technique.The effect of fabrication conditions and surface treatment after annealing on the porosity and other properties have been also discussed in this paper.
Keywords:nanometer porous silica  sol-gel thin film  porosity control  
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