P—Si上电沉积非晶Ni—W—P薄膜的耐蚀性研究

对Ｐ－Ｓｉ上电沉积Ｎｉ－Ｗ－Ｐ合金薄膜在３％ＮａＣｌ、０．５ｍｏｌ·ｄｍ＾－３Ｈ２ＳＯ４、１ｍｏｌ·ｄｍ＾－３ＨＣｌ介质中的阳极溶解行为进行了研究，ＸＰＳ分析了钝化膜中各元素的化学价态和存在形式。结果表明，非晶Ｎｉ－Ｗ－Ｐ合金薄膜的耐蚀性远优于晶态Ｎｉ－Ｗ－Ｐ薄膜和非晶Ｎｉ－Ｐ薄膜；高Ｗ含量的非晶Ｎｉ－Ｗ－Ｐ合金薄膜，有较强的耐蚀能力；在ＮａＣｌ介质中非晶Ｎｉ－Ｗ－Ｐ合金形成了由Ｎｉ２Ｏ３、ＮｉＨ

Study of the Corrosion-Resistance of Electrodeposited Ni-W-P Alloy-Films on Silicon

This present paper studies the anodic stripping behaviours of electrodeposited Ni -- W -- P alloy-films on p-type silicon in 3%NaCl solution, 0. 5mol' dm-3H2SO4 solution and 1mol-3 din --3HCl solution respectivety. It also investigstes the chemical composition of thepassive film formed in 3% NaCl solution by X-ray Photoelectron spectroscopy. The result shows that the corrosion resiStance of theamorphous Ni -- W -- P alloy-film is much better than that of crystalline Ni -- W -- P and amorphous Ni -- P films. The amorphous Ni -- W-P alloy -- film with high W content shows relatively strong corrosion resistance. The passive film that the amorphous Ni -- W -- P alloy in theabove mentioned NgCl solution produces is a mixture of Ni2O3, NiHPO4 and WO3.