Research of optical and structural properties in Cu/Ti multilayer films |
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Authors: | Chengtao Yang Shuren Zhang Jiahui Luo Yan Li Yanrong Li |
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Affiliation: | School of Micro-electronic & Solid-Electronic, University of Electronic Science and Technology of China, Chengdu 610054, PR China |
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Abstract: | ![]() The Cu/Ti multilayer (ML) films were deposited on Si(1 0 0) and Si(1 1 1) substrate with a series of pair layers with Vanguard sputtering system. The influences of periodic number and substrate structure on UV-reflectivity of Cu/Ti superlattice films were investigated carefully. The result shows that the Cu/Ti ML films have clear layer-structure. The ML films deposited on Si(1 0 0) and Si(1 1 1) have UV-reflectivity of about 90% and 67% at 200 nm, respectively, but they have lower soft X-ray reflectivity of about 1.9% at 13.04 nm in terms of wavelength, with near normal incidence of 5°. The transmission microscope image indicates that the fabricated Cu/Ti ML films have superlattice structure. |
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Keywords: | Multilayer Reflectivity Periodic structure Superlattice |
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