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A concise process technology for 3-D suspended radio frequency micro-inductors on silicon substrate
Authors:Liang   Y.C. Wenjiang Zeng Pick Hong Ong Zhaoxia Gao Jun Cai Balasubramanian   N.
Affiliation:Dept. of Electr. Eng. & Comput. Sci., Univ. of California, Berkeley, CA, USA;
Abstract:
In this letter, a concise process technology is proposed for the first time to enable the fabrication of good quality three-dimensional (3-D) suspended radio frequency (RF) micro-inductors on bulk silicon, without utilizing the lithography process on sidewall and trench-bottom patterning. Samples were fabricated to demonstrate the applicability of the proposed process technology.
Keywords:
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