| SU-8胶及其在MEMS中的应用 |
| |
| 引用本文： | 刘景全,蔡炳初,陈迪,朱军,赵小林,杨春生. SU-8胶及其在MEMS中的应用[J]. 微纳电子技术, 2003, 0(Z1) |
| |
| 作者姓名： | 刘景全 蔡炳初 陈迪 朱军 赵小林 杨春生 |
| |
| 作者单位： | 上海交通大学微纳米科学技术研究院 上海20030(刘景全，蔡炳初，陈迪，朱军，赵小林)，上海交通大学微纳米科学技术研究院 上海20030(杨春生) |
| |
| 摘 要： | SU 8胶是一种负性、环氧树脂型、近紫外线光刻胶。它适于制超厚、高深宽比的MEMS微结构。SU 8胶在近紫外光范围内光吸收度低 ,故整个光刻胶层所获得的曝光量均匀一致 ,可得到具有垂直侧壁和高深宽比的厚膜图形 ;它还具有良好的力学性能、抗化学腐蚀性和热稳定性 ;SU 8胶不导电 ,在电镀时可以直接作为绝缘体使用。由于它具有较多优点 ,被逐渐应用于MEMS的多个研究领域。本文主要分析SU 8胶的特点 ,介绍其在MEMS的一些主要应用 ,总结了我们研究的经验 ,以及面临的一些问题 ,并对厚胶技术在我国的应用提出建议和意见
|
| 关 键 词： | SU-8胶 MEMS 厚胶技术 |
SU-8 photoresist and its application in MEMS |
| |
| LIU Jing quan,CAI Bing chu,CHEN Di,ZHU Jun,ZHAO Xiao lin,YANG Chun sheng. SU-8 photoresist and its application in MEMS[J]. Micronanoelectronic Technology, 2003, 0(Z1) |
| |
| Authors: | LIU Jing quan CAI Bing chu CHEN Di ZHU Jun ZHAO Xiao lin YANG Chun sheng |
| |
| Abstract: | SU 8 is a negative, epoxy type, near UV photoresist based on EPON SU 8 epoxy resin. Due to its low optical absorption in UV range, this photoresist can be very thick films. It also has a high functionality that results in a high degree of cross linking producing straight sidewall profiles and high aspect ratios. It has fine mechanical properties, withstanding chemical causticity, and high thermal stability. This resist is well suited for acting as a mold for electroplating because of its insulation. The high aspect ratio resist, SU 8, lends itself well to MEMS applications, packaging, micromolds, spacers, etc. In this paper, we analyze the properties of SU 8 resist, and show some applications. Also, we provide some our researches and experiences, some problems we met, and some advices are given for the thick film technique in our country. |
| |
| Keywords: | SU 8 photoresist MEMS thick film technique |
| 本文献已被 CNKI 等数据库收录！ |
|
