| 磁控共溅射制备氮化钛铝薄膜及其机械性能的研究 |
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| 引用本文： | 倪晟,孙卓,赵强.磁控共溅射制备氮化钛铝薄膜及其机械性能的研究[J].功能材料,2005,36(12):1842-1844,1848. |
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| 作者姓名： | 倪晟 孙卓 赵强 |
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| 作者单位： | 华东师范大学,物理系纳米功能材料与器件应用研究中心,上海,200062;华东师范大学,物理系纳米功能材料与器件应用研究中心,上海,200062;华东师范大学,物理系纳米功能材料与器件应用研究中心,上海,200062 |
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| 基金项目： | 上海市科委纳米专项资助项目（0452nm048;0352nm077）;上海市科委科技攻关项目资助项目（035211036）;教育部科学技术研究重点资助项目（02105）;教育部“跨世纪优秀人才培养计划”基金资助项目（03-04） |
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| 摘 要： | 使用磁控共聚焦溅射技术并改变溅射过程中Al的功率来制备了一系列Al含量不同的氮化钛铝（TiAlN）薄膜。在溅射过程，薄膜沉积速率和Al含量随Al的溅射功率增加而增大，而薄膜的粗糙度减小。Al含量较低时（约21％），TiAlN薄膜的硬度和弹性模量都高于TiN薄膜。而Al含量较高时（〉26％），薄膜的硬度和弹性模量也随含量增加减小。
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| 关 键 词： | TiAlN薄膜 磁控共溅射 纳米压痕仪 机械性能 |
| 文章编号： | 1001-9731（2005）12-1842-03 |
| 收稿时间： | 2005-04-13 |
| 修稿时间： | 2005-04-132005-07-30 |
Deposition of TiAlN film by reactive magnetron co-sputtering and related mechanical properties |
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| NI Sheng,SUN Zuo,ZHAO Qiang.Deposition of TiAlN film by reactive magnetron co-sputtering and related mechanical properties[J].Journal of Functional Materials,2005,36(12):1842-1844,1848. |
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| Authors: | NI Sheng SUN Zuo ZHAO Qiang |
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| Affiliation: | Nanotech Centre, East China Normal University, Shanghai 200062,China |
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| Abstract: | The TiAlN films with different Al contents were deposited by a reactive magnetron co-sputtering system by changing Al sputtering power,and Al percentage in TiAlN film could be controlled by controlling the Al sputtering power.The increase of Al sputtering power resulted in the increase of the deposition rate and Al contents in the film,and the decrease of the film roughness.It was found that the hardness and elastic modulus of TiAlN film was higher than that of TiN film at low Al percentage(about 21%),but became lower at high Al percentage(>26%). |
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| Keywords: | titanium aluminum nitride reactive magnetron co-sputtering nanoindentation mechanical properties |
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