| 直流电弧等离子体喷射法高速制备高质量纳米金刚石膜研究 |
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| 引用本文： | 相炳坤,;左敦稳,;李多生,;陈荣发. 直流电弧等离子体喷射法高速制备高质量纳米金刚石膜研究[J]. 珠宝科技, 2008, 0(5): 1-4 |
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| 作者姓名： | 相炳坤, 左敦稳, 李多生, 陈荣发 |
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| 作者单位： | [1]南京航空航天大学江苏省精密与微细制造重点实验室,南京210016; [2]南京航空航天大学机电学院,南京210016 |
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| 基金项目： | 国家自然科学基金（项目号;50275076）. |
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| 摘 要： | 利用直流电弧等离子体喷射法沉积装置在底径Ф65mm高5mm的Mo球面衬底上成功制备出纳米金刚石薄膜，文章研究了在稳定电弧状态下碳氢比对金刚石膜形貌的影响。通过扫描电子显微镜、原子力显微镜及Raman光谱对样品的晶粒尺寸及质量进行了表征。研究结果表明：在稳定电弧状态下，通过提高碳氢比可以在Mo球面衬底上的表面高速沉积出高质量的纳米金刚石薄膜，晶粒尺寸大约为4-80nm，平均粒径27．4nm。
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| 关 键 词： | 纳米金刚石膜 直流电弧等离子体喷射法 碳氢比 |
Nano-diamond films high-speed and high-quality deposited by using DC arc plasma jet CVD |
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| Affiliation: | XIANG Bing-kun, ZUO Dun-wen, LI Duo-sheng, CHENG Rong-fa (1. Jiangsu Key Laboratory of precision ＆ micro-fabrication of Nanjing University of Aeronautics and Astronautics, Nanjin g 210016,China;2. College of Mechanical and Electrical Engineering , Nanjin g University of Aeronautics and Astronautics ,Nanjing 210016 ,China) |
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| Abstract: | Nano-diamond films were gown up via the technique of DC Arc Plasma Jet on Mo spherical substrate of 65mm bottom diameter and 5 mm height. Effect of CH4 concentration on morphology of diamond films was investigated. The grain size and quality of the samples was characterized with a combination of Raman spectroscopy, atomic force microscopy （AFM） and Scanning Electron Microscope （SEM）. The results show that the high quality nano-diamond film can be deposited on Mo spherical substrate by increasing the CH4 concentration, the grain size was observed to be approximately 4-80 nm and the mean grain diameter was 27.4nm by AFM. DC Arc Plasma Jet CVD is very suitable for high-speed and high-quality deposition of nano-diamond films. |
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| Keywords: | nano-diamond film DC Arc Plasma Jet CVD C/H |
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