Suppression of twin formation in CdTe(111)B epilayers grown by molecular beam epitaxy on misoriented Si(001) |
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Authors: | Y P Chen J P Faurie S Sivananthan G C Hua N Otsuka |
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Affiliation: | (1) Physics Department (M/C 273), University of Illinois at Chicago, Microphysics Laboratory, 845 W. Taylor St. Room # 2236, 60607-7059 Chicago, IL;(2) School of Materials Engineering, Purdue University, 47907 West Lafayette, IN |
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Abstract: | CdTe(lll)B layers have been grown on misoriented Si(001). Twin formation inside CdTe(lll)B layer is very sensitive to the
substrate tilt direction. When Si(001) is tilted toward 110] or 100], a fully twinned layer is obtained. When Si(001) is
tilted toward a direction significantly away from 110], a twin-free layer is obtained. Microtwins inside the CdTe(111)B layers
are overwhelmingly dominated by the lamellar twins. CdTe(111)B layers always start with heavily lamellar twinning. For twin-free
layers, the lamellar twins are gradually suppressed and give way to twin-free CdTe(111)B layer. The major driving forces for
suppressing the lamellar twinning are the preferential orientation of CdTe11-2] along Si1-10] and lattice relaxation. Such
preferential orientation is found to exist for the CdTe(111)B layers grown on Si(001) tilted toward a direction between 110]
and 100]. |
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Keywords: | CdTe/Si Heteroepitaxy Molecular beam epitaxy (MBE) Twinning |
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