首页 | 本学科首页   官方微博 | 高级检索  
     


Introduction of lysine residues on the light chain constant domain improves the labelling properties of a recombinant Fab fragment
Authors:Hemminki  Ari; Hoffren  Anna-Marja; Takkinen  Kristiina; Vehniainen  Markus; Makinen  Maija-Liisa; Pettersson  Kim; Teleman  Olle; Soderlund  Hans; Teeri  Tuula T
Affiliation:VTT Biotechnology and Food Research PO Box 1503, Fin-02044 VTT, Espoo 2 Orion Corporation, Orion-Farmos, Fin-20101, Turku 3Department of Biochemistry, University of Turku Fin-20520, Turku 4 Wallac Oy, Fin-20101, Turku, Finland
Abstract:Europium chelates provide a non-radioactive alternative forsensitive labelling of antibodies for diagnostic immunoassays.Lysine residues at antibody surfaces are ready targets for labellingby an isothiocyanate derivative of the europium chelate (Eu3+).Here the labelling efficiency of a recombinant anti-human {alpha}-fetoprotein(hAFP) Fab fragment has been improved by increasing its lysinecontent by protein engineering. Molecular modelling was usedto identify three light chain constant domain surface arginineresidues, R154, R187 and R210, which were mutated to lysineresidues. The mutations did not influence the affinity of thelysine-enriched Fab fragment and its labelling efficiency wasfound to be ~40% higher than that of the wildtype Fab fragmentWith low degree of labelling, the affinities of the two Fabfragments were identical and comparable with that of the originalmonoclonal anti-hAFP IgG. With a higher degree of labellingthe affinities of both Fab fragments decreased more than thatof the intact IgG since more lysine residues are available forlabelling in the additional heavy chain constant domains ofthe larger molecule. Electrostatic adsorption and covalent immobilizationof the Fab fragments were characterized by BIAcoreTM and thelysine-enriched Fab fragment was found to be more efficientlyimmobilized to an activated carboxymethyl surface.
Keywords:Eu3+ labelling/  molecular modelling/  recombinant Fab fragment/  site-directed mutagenesis/  surface residues
本文献已被 Oxford 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号