| 强脉冲电子束在聚酯薄膜表面产生的化学气相沉积 |
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| 引用本文： | 韩丽君,江兴流.强脉冲电子束在聚酯薄膜表面产生的化学气相沉积[J].核化学与放射化学,1988,10(4):245. |
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| 作者姓名： | 韩丽君 江兴流 |
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| 作者单位： | 兰州大学
(韩丽君)，兰州大学(江兴流) |
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| 摘 要： | 一、引言 高功率密度脉冲电子束(>10~9W/cm~2)轰击金属,将引起金属剧烈蒸发,产生高温等离子体。等离子体中的金属离子获得一定能量后将与本底气体分子相互作用而形成化合物。本文介绍在低压氮气环境中,利用强脉冲电子束轰击铜靶,产生了氮铜化合物沉积在聚酯薄膜表面的实验结果。并用ESCA分析束处理过的聚酯薄膜表面的化学组成的变化。
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| 关 键 词： | 脉冲电子束 化学气相沉积 等离子体 |
CHEMICAL VAPOR DEPOSITION WITH INTENSE PULSED ELECTRON BEAM ON THE SURFACE OF POLYETHYLENE TEREPHTHALATE FILM |
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| HAN LIJUN JIANG XINGLIU.CHEMICAL VAPOR DEPOSITION WITH INTENSE PULSED ELECTRON BEAM ON THE SURFACE OF POLYETHYLENE TEREPHTHALATE FILM[J].Journal of Nuclear and Radiochemistry,1988,10(4):245. |
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| Authors: | HAN LIJUN JIANG XINGLIU |
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| Affiliation: | Lanzhou University |
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| Abstract: | Copper nitride films are deposited on the surface of polyethylene terephtha-late film by using intense pulsed electron beam to create a high temperature dense plasma.The irradiation effect of the electron beam on polymers has been observed and chemical properties of these films are described.A variety of chemical species could be created by using this method of chemical vapor deposition with an intense pulsed electron beam. |
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| Keywords: | Pulsed electron beam Chemical vapor deposition Dense plasma |
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