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脉冲宽度对偏转电场法内表面等离子体浸没离子注入的影响
引用本文:刘爱国,陆显文,王小峰,汤宝寅. 脉冲宽度对偏转电场法内表面等离子体浸没离子注入的影响[J]. 材料科学与工艺, 1999, 0(Z1)
作者姓名:刘爱国  陆显文  王小峰  汤宝寅
作者单位:哈尔滨工业大学现代焊接生产技术国家重点实验室!黑龙江哈尔滨150006
摘    要:
近年来 ,采用等离子体浸没离子注入 (PIII)对零部件内表面进行改性处理引起了各国研究工作者的广泛关注 .研究表明 ,提出的偏转电场法是进行内表面注入处理的有效方法 ,可以极大提高内表面注入的注入剂量和注入能量 .研究了采用偏转电场法注入时注入电压脉冲宽度对注入效果的影响 .结果表明 ,长注入脉宽可以提高内表面注入能量 ,但对注入剂量影响不大 ;脉冲宽度对注入峰值深度和注入剂量的分布有很大影响 ,长注入脉宽使注入峰值深度和注入剂量的最大值向筒内部移动 ;采用适当的不同宽度脉冲进行注入 ,可以改善注入均匀性 .

关 键 词:等离子体浸没离子注入  脉冲宽度  偏转电场法  内表面

Influence of pulse duration on deflecting electric field inner surface plasma immersion ion implantation
LIU Ai guo,LU Xian wen,WANG Xiao feng,TANG Bao yin. Influence of pulse duration on deflecting electric field inner surface plasma immersion ion implantation[J]. Materials Science and Technology, 1999, 0(Z1)
Authors:LIU Ai guo  LU Xian wen  WANG Xiao feng  TANG Bao yin
Abstract:
Modification of inner surface with plasma immersion ion implantation (PIII) has drawn a lot of attention of researchers from all over the world. The deflecting electric field method we presented has been proved to be valid for inner surface PIII, and can increase retained dose and implant energy greatly. Influence of pulse duration on deflecting electric field PIII was investigated in this paper. The results showed that long pulse could increase impact energy on inner surface but had little effect on retained dose. Distribution of peak implant depth and retained dose were greatly influenced by pulse duration, and long pulse moved the maximum values deeper into the bore. Homogeneity could be improved with mixing of different pulse duration.
Keywords:plasma immersion ion implantation  pulse duration  deflecting electric field  inner surface
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