Structure characterization of F-doped silica glass |
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Authors: | Junlin Xie Tao Deng Feng Tu Jie Luo Qingrong Han |
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Affiliation: | (1) Key Laboratory for Silicate Materials Science and Engineering of Ministry of Education, Wuhan University of Technology, Wuhan, 430070, China;(2) Yangtze Optical Fibre and Cable Company Ltd., Wuhan, 430073, China |
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Abstract: | Pure and fluorine-doped silica glass were fabricated by plasma chemical vapour deposition (PCVD) and characterized using Raman
and infrared spectrum. The change in Raman intensity of 945 cm−1 peak, relating to ≡Si—F stretching vibration, agrees with the change of F content. Compared with measured wavenumber in IR
spectrum, the calculated absorption wavelength confirms the incorporation form of F into the glass, the detail of which is
a tetrahedron with a Si atom in the center coupled with one F atom and three network O atoms. Such structure identification
may be useful for explaining some properties of F-doping silica glass. |
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Keywords: | silica glass fluorine PCVD incorporation form |
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