| 脉冲电弧源的发射特性建模 |
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| 引用本文： | 刘缠牢,梁海锋,蔡长龙.脉冲电弧源的发射特性建模[J].真空,2006,43(5):6-8. |
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| 作者姓名： | 刘缠牢 梁海锋 蔡长龙 |
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| 作者单位： | 西安工业大学薄膜技术与光学检测重点实验室,陕西 西安 710032 |
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| 摘 要： | 脉冲电弧源是脉冲电弧离子镀方法制备薄膜的重要部件，其发射特性是影响薄膜均匀性的重要因素，本文从理论出发，建立脉冲电弧源发射特性的数学模型，编程计算得到理论的均匀性曲线，与实际的沉积薄膜厚度的均匀性对比，结果表明：脉冲电弧源的蒸发特性可以等效于多个面源的叠加，每一个面源发射的离子密度空间分布符合余弦定律。
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| 关 键 词： | 脉冲电弧 发射特性 数学模型 |
| 文章编号： | 1002-0322（2006）05-0006-03 |
| 收稿时间： | 2006-02-18 |
| 修稿时间： | 2006年2月18日 |
Modeling of emission properties of pulsed arc source |
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| LIU Chan-lao,LIANG Hai-feng,CAI Chang-long.Modeling of emission properties of pulsed arc source[J].Vacuum,2006,43(5):6-8. |
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| Authors: | LIU Chan-lao LIANG Hai-feng CAI Chang-long |
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| Affiliation: | Key Laboratory of Film Technology and Optical Measurement, Xian Technological Institute, Xian 710032, China |
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| Abstract: | Pulsed arc ion emitter or source is an integral part of pulsed arc thin film deposition process,and its emission(properties) play a key role in the films' uniformity.A theoretical model is developed by analyzing the emission properties,with a theoretical uniformity curve given by computer.Moreover,diamond-like carbon films are deposited on silicon substrate to measure their thickness for getting actual uniformity.Comparative results showed that the evaporation properties of pulsed arc source are equivalent to an aggregate of many plane sources,and the space distribution of ion density from each plane source is in accordance with the cosine law. |
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| Keywords: | pulsed arc emission properties mathematic model |
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