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Deposition of nanocrystalline ZnO thin films on p-Si by novel galvanic method and application of the heterojunction as methane sensor
Authors:P Bhattacharyya  P K Basu  N Mukherjee  A Mondal  H Saha  S Basu
Affiliation:(1) IC Design and Fabrication Center, Department of Electronics and Telecommunication Engg, Jadavpur University, Kolkata, 700032, India;(2) Department of Chemistry, Bengal Engineering and Science University, Shibpur, Howrah, 71103, India
Abstract:Undoped nanocrystalline n-ZnO thin films were deposited by a novel galvanic technique at room temperature on p-Si 〈100 〉 substrates to fabricate ZnO–Si heterojunctions. The IV characteristics were studied at different temperatures with two different metallic contacts e.g., gold and palladium–silver (26%), in air and in presence of different concentrations (0.1, 0.5 and 1%) of methane gas. A shift in IV characteristics in presence of methane was observed. The sensitivity and response time were studied at different temperatures (30 through 350 °C). Pd–Ag (26%) catalytic contacts showed much improved sensor performance.
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