| 氧化铝粒子化学气相包覆氧化钛的过程研究 |
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| 引用本文： | 李春忠,韩今依.氧化铝粒子化学气相包覆氧化钛的过程研究[J].化工学报,1995,46(2):193-199. |
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| 作者姓名： | 李春忠 韩今依 |
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| 作者单位： | 华东理工大学技术化学物理研究所,华东理工大学技术化学物理研究所,华东理工大学技术化学物理研究所,华东理工大学技术化学物理研究所,华东理工大学技术化学物理研究所 上海200237,上海200237,上海200237,上海200237,上海200237 |
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| 基金项目： | 国家自然科学基金资助项目 |
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| 摘 要： | 探讨了回转炉化学气相淀积（CVD）包覆新工艺,利用Ti（OC_4H_9）_4水解,在Al_2O_3粒子表面实现了TiO_2包覆,研究了包覆过程特征。结果表明,TiO_2在Al_2O_3粒子表面的包覆是成功的,并具有一定的致密性,包覆量为0.1%～10%;化学气相包覆过程中既存在成膜包覆,又存在成核包覆,通过控制反应物浓度等方法可以强化成膜包覆,提高包覆效果。
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| 关 键 词： | 回转炉 气相淀积 氧化钛 表面加工 氧化铝粒子 |
PROCESS STUDY OF TiO_2 COATING ON A1_2O_3 PARTICLES BY CHEMICAL VAPOR DEPOSITION TECHNOLOGY |
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| Li Chunzhong,Han Jinyi,Hu Liming,Hua Bin and Zhu Hongjie.PROCESS STUDY OF TiO_2 COATING ON A1_2O_3 PARTICLES BY CHEMICAL VAPOR DEPOSITION TECHNOLOGY[J].Journal of Chemical Industry and Engineering(China),1995,46(2):193-199. |
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| Authors: | Li Chunzhong Han Jinyi Hu Liming Hua Bin and Zhu Hongjie |
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| Abstract: | The process of Chemical Vapor Deposition (CVD) coating was investigated in the rotating reactor. Base on this ,TiO2 was coated on A12O3 particles by using hydrolysis reaction of Ti(OC4H9)4, and the mechanism of the coating process was studied. The results indicated that : (1) The coating film of TiO2 on A12O3 was compactness and uniform, and the coating quantity of TiO2 was about 0. 1%-10%; (2) The coated TiO2 was amorophous at low reaction temperature and was anatase at reaction temperature higher than 673K, the amorophous TiO2 could be translated to anatase by high temperature heat treatment; (3) Nucleation and film formation co - existed in the coating process, and nucleation could be promoted by controlling the concentration of reactant. |
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| Keywords: | rotating reactor chemical vapor deposition coating nucleation film forming |
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