Carbon based conductive photoresist |
| |
Authors: | Nina Hauptman Ma?a ?vegli? Marijan Ma?ek Marta Klanj?ek Gunde |
| |
Affiliation: | (1) National Institute of Chemistry, Hajdrihova 19, Ljubljana, 1000, Slovenia;(2) Faculty of Electrical Engineering, University of Ljubljana, Tržaška 25, Ljubljana, 1000, Slovenia |
| |
Abstract: | A conductive photoresist for photolithographic application was studied here. The negative near-UV sensitive epoxy-based photoresist
was used as a polymer matrix and conductive carbon black was used as functional filler. DC electrical resistivity of composite
as a function of filler concentration has a well-known S-shape. After UV-exposure the resistivity of the composite decreases
for almost five orders of magnitude, mostly at percolation threshold (approx. 0.6 vol.%). This effect can be attributed to
the fully cross-linked polymer structure formed during UV-exposure of the composite. The resistivity of prepared samples also
depend on the state of dispersion of the functional filler obtained using different dispersing additives. Composites with
better dispersed particles have lower resistivities. This effect remained below one order of magnitude and decreased after
UV-exposure. The composites with carbon black concentration of up to 1.1 vol.% are suitable for spin-coating and photolithography. |
| |
Keywords: | |
本文献已被 SpringerLink 等数据库收录! |
|