制备条件对电致变色氧化镍薄膜特性的影响

在充氧气的真空室内 ,用电子束蒸发NiO粉末颗粒的方法分别以 0 1和 0 8nm/s的淀积速率制备了氧化镍薄膜 ,并在不同的环境中对薄膜进行热处理。研究了薄膜结构和电致变色特性与淀积速率的关系 ,发现以较慢和较快速率淀积的薄膜分别具有NiO晶粒的 (2 0 0 )和 (111)不同择优取向 ,前者致色范围较小 ,后者致色范围较大。还研究了热处理对薄膜的结构、动态致色范围、致色效率 ,以及红外光谱特性的影响 ,发现热处理对薄膜的致色效率影响较小 ,然而对动态致色范围的影响很大。

Sample Preparation Conditions and the Characteristics of the Electrochromic Nickel Oxide Film

Nickel oxide films were grown by electron beam evaporation of NiO powder in low pressure oxygen environments.The films were then annealed under different conditions.We found that deposition rates and sample annealing temperatures may affect the characteristics of the film,including its microstructures,transmittance modulation range,electrochromic efficiency and infrared spectrum.In the case of a high deposition rate,0.8 nm/s,the film contains NiO crystallites with a [111] preferential growth orientation,whereas the film,grown at a much lower deposition rate,0.1 nm/s,contains NiO crystallites with a [200] preferential growth orientation.The color modulation ranges of the former is found to be greater than that of the latter.The results indicate that annealing temperature may significantly change the transmittance modulation range of the film,especially the films grown at lower deposition rate,for instance,the rate of 0.1 nm/s,but has no influence on the electrochromic efficiency.