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Sol-gel法制备多铁性Bi_(0.85)Eu_(0.15)FeO_3薄膜及其性能
引用本文:付承菊,黄志雄,李杰,郭冬云.Sol-gel法制备多铁性Bi_(0.85)Eu_(0.15)FeO_3薄膜及其性能[J].材料导报,2010,24(4).
作者姓名:付承菊  黄志雄  李杰  郭冬云
作者单位:武汉理工大学材料科学与工程学院,武汉,430070;重庆科技学院机械工程学院,重庆,400042
基金项目:国家自然科学基金青年科学基金 
摘    要:采用Sol-gel法在Pt/Ti/SiO2/Si衬底上制备了Bi0.85Eu0.15FeO3薄膜。研究了退火温度对其晶相形成的影响,发现在较低温度退火(450℃)时,Bi0.85Eu0.15FeO3晶相开始形成,但存在杂相,而且结晶度较差;在490~600℃可以获得结晶较好的单相Bi0.85Eu0.15FeO3薄膜。同时对经550℃退火的薄膜的介电、铁电和铁磁性能进行了研究,结果表明,Bi0.85Eu0.15FeO3薄膜具有较好的介电及铁磁性能。当测试频率为1MHz时,薄膜的介电常数和介电损耗分别为80、0.024,饱和磁化强度约为26.2emu/cm3。

关 键 词:Sol-gel法  Bi0.85Eu0.15FeO3  薄膜  介电性能  铁电性能  铁磁性能

Preparation and Multiferroic Properties of Bi_(0.85)Eu_(0.15)FeO_3 Thin Films Prepared by Sol-gel Method
FU Chengju,HUANG Zhixiong,LI Jie,GUO Dongyun.Preparation and Multiferroic Properties of Bi_(0.85)Eu_(0.15)FeO_3 Thin Films Prepared by Sol-gel Method[J].Materials Review,2010,24(4).
Authors:FU Chengju  HUANG Zhixiong  LI Jie  GUO Dongyun
Abstract:The Bi_(0.85)Eu_(0.15)FeO_3 thin films are prepared by the sol-gel method on the Pt/Ti/SiO_2/Si substrata.Effect of annealing temperature on the formation of Bi_(0.85)Eu_(0.15)FeO_3 phase is investigated.It is found that the Bi_(0.85)Eu_(0.15)FeO_3 phase appears in the films annealed at low temperature (450℃),but the degree of crystallinity is poor and the impurity phase exists in the films.The well crystalline and single Bi_(0.85)Eu_(0.15)FeO_3 phase of the films annealed at 490~600℃ can be obtained.The dielectric properties,ferroelectric properties,and ferromagnetic properties of the film annealed at 550℃ are investigated.The Bi_(0.85)Eu_(0.15)FeO_3 film shows good dielectric and ferromagnetic properties.When the measuring frequency is 1MHz,the dielectric constant and dielectric loss are 80 and 0.024,respectively.The saturated magnetization is about 26.2emu/cm~3.
Keywords:Bi0  85Eu0  15FeO3  sol-gel method  Bi_(0  85)Eu_(0  15)FeO_3 thin film  dielectric properties  ferroelectric properties  ferromagnetic properties
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